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发明公开
CN107873063A 高长径比的光学精加工薄金刚石基材或窗及其制造方法 有权

高长径比的光学精加工薄金刚石基材或窗及其制造方法
摘要：
在金刚石膜、基材或窗的形成方法中，提供一种硅基材，并且金刚石膜、基材或窗CVD生长在硅该基材的表面。生长的金刚石膜、基材或窗具有≥100的长径比，其中所述长径比是金刚石膜、基材或窗的最大尺寸除以金刚石膜的厚度所得的比值。可任选地从金刚石膜、基材或窗上除去或分离该硅基材。
摘要（英）：

In a method of forming a diamond film, substrate, or window, a silicon substrate is provided and the diamond film, substrate, or window is CVD grown on a surface of the silicon substrate. The grown diamond film, substrate, or window has an aspect ratio > 100, wherein the aspect ratio is a ratio of a largest dimension of the diamond film, substrate or window divided by a thickness of the diamond film. The silicon substrate can optionally be removed or separated from the grown diamond film, substrate, or window.

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