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发明公开
CN108051984A 狭缝可调节的曝光装置 有权

狭缝可调节的曝光装置
摘要：
本发明公开了一种狭缝可调节的曝光装置，所述曝光装置包括：第一构件、第二构件以及粗调机构，所述第一构件具有第一弧面，所述第二构件具有第二弧面，所述第一弧面与所述第二弧面相对设置且两者之间限定出狭缝，所述粗调机构可用于驱动所述第一弧面和所述第二弧面中的一个运动以调节所述狭缝的宽度。根据本发明的曝光装置，通过粗调机构调整第一构件与第二构件之间的距离，以对曝光装置的照度进行调整，这样不仅可以通过调整狭缝的宽度，以调整曝光装置的照度，均衡照度和解像力，满足产品的解像力要求，而且在调整狭缝的宽度时，无需拆卸曝光装置，节约了产能，提高了生产效率。
摘要（英）：

The invention discloses an adjustable-slit exposure device. The exposure device comprises a first member, a second member and a rough adjustment mechanism, wherein the first member is provided with afirst arc surface, the second member is provided with a second arc surface, the first arc surface and the second arc surface are opposite to each other, a slit is defined between the first arc surfaceand the second arc surface, and the rough adjustment mechanism can be used for driving one of the first arc surface and the second arc surface to adjust the width of the slit. According to the exposure device, the distance between the first member and the second member is adjusted by the rough adjustment mechanism so as to adjust illumination of the exposure device, the width of the slit can be adjusted, the illumination of the exposure device is adjusted, the illumination and the resolution are equalized, and the resolution requirement of a product is met; and moreover, the exposure device is not needed to be disassembled during adjustment of the width of the slit, the yield is saved, and the production efficiency is improved.

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