The invention discloses magnetron sputtering equipment and a baffle plate component thereof, wherein the baffle plate component comprises a first baffle plate and a second baffle plate which are in lap joint with each other; the first baffle plate and/or the second baffle plate are/is arranged as arc-shaped structures/an arc-shaped structure; and the circle center of the first baffle plate and thecircle center of the second baffle plate are correspondingly arranged at the two sides of the baffle plate component. The first baffle plate and the second baffle plate are preset as arc-shaped structures so that internal force of the baffle plates can be beneficially released, and thus the risk of deformation of the baffle plates can be reduced.