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发明公开
CN108335996A 基板处理装置、基板处理方法以及存储介质 审中-实审

基板处理装置、基板处理方法以及存储介质
摘要：
提供一种基板处理装置、基板处理方法以及存储介质。本发明防止由于基板的上表面的清洗中所使用的处理液而基板的下表面被污染。本发明在一边利用基板保持旋转部使基板旋转一边并行地进行基板的上表面和下表面的液处理之后，在使基板的上表面和下表面的液处理这两方结束时，控制部(18)先使处理液供给机构(73)对基板的上表面的处理液的供给结束，之后使处理液供给机构(71)对基板的下表面的处理液的供给结束。
摘要（英）：

Provided are a substrate processing apparatus, substrate processing method and storage medium. Contamination of a bottom surface of a substrate caused by a processing liquid used for cleaning a top surface of the substrate can be suppressed. After performing a liquid processing on the top surface of the substrate and a liquid processing on the bottom surface of the substrate in parallel while rotating the substrate by a substrate holding/rotating unit, when stopping the liquid processing on the top surface of the substrate and the liquid processing on the bottom surface of the substrate, a control unit 18 stops a supply of the processing liquid onto the top surface of the substrate by a processing liquid supply device 73, and then, stops a supply of the processing liquid onto the bottom surface of the substrate by a processing liquid supply device 71.

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