The invention relates to a preparation method of a non-dense ordered polystyrene nanosphere template, and belongs to the technical field of preparation of nanometer structures. The preparation methodspecifically comprises the following steps of after a silicon wafer is cleaned, passivating the surface of the silicon wafer by hydrogen; self-assembling a single-layer dense polystyrene nanosphere thin film on the silicon wafer, and utilizing normal incidence type Ar<+> ion beams to bombard the nanosphere thin films of different diameters, wherein the density of beam flow is 0.85 to 3.0mA/cm<2>,the energy of Ar<+> is 0.5 to 1.0keV, and the bombarding time is 5 to 28min; after bombarding by the ion beams, the diameter of each nanosphere is reduced, and the location of each nanosphere is not changed, so as to obtain the non-dense ordered polystyrene nanosphere template. The preparation method of the non-dense ordered polystyrene nanosphere template has the advantages that the size and cycle of the nanoparticle in the template are adjusted by the initial diameter and bombarding condition of the polystyrene nanosphere; the etching rate of the nanosphere is adjustable within the range of6.19 to 17.32nm/min; compared with the ion beam etching technique, the etching rate is low, and the quality of the small-size polystyrene nanosphere template is favorably controlled; the cost is low,the technology is simple, and the stability is high; the non-dense ordered polystyrene nanosphere template can be applied to the study and development fields of ordered nanowires, nanorods, nanoporesand nanomesh arrays.