The invention provides a fast non-destructive ellipsometric test method for a boron-rich layer and a borosilicate glass layer. Specifically, a preparation method includes the steps: testing a sample Awith an ellipsometric analyzer, to obtain a [psi](A)-[lambda] curve of the sample A, and testing a sample B by the ellipsometric analyzer, to obtain a [psi](B)-[lambda] curve of the sample B; based on first principles, obtaining optical properties of main components of the boron-rich layer of the sample A, leading out curves of the corresponding refractive index and light absorption coefficient of the boron-rich layer at different wave bands, combining with ellipsometric numerical analysis, calculating to obtain the thickness, refractive index and extinction coefficient of the boron-rich layer of the sample A, introducing the thickness, refractive index and extinction coefficient of the boron-rich layer of the sample A into the [psi](B)-[lambda] curve of the sample B, and fitting and analyzing to obtain the thickness, refractive index and extinction coefficient of the borosilicate glass layer of the sample B. The preparation method has the advantages of speediness, no destruction andaccurate measurement.