The present disclosure relates to a measuring method, a measuring apparatus, an exposing device, and a method of manufacturing an article. The measurement method includes a first step of exposing first patterns, which have a plurality of first marks and are transferred to a substrate, in an image pickup area, and respectively staggering in a row direction and a column direction in such a manner that no duplication with an adjacent image pickup area occurs while repeating many times to form a plurality of first patterns in the row direction and the column direction; a second step of exposing aplurality of second marks and second patterns of the plurality of the second marks locating around the plurality of second marks are transferred to the image pickup area of the substrate, and respectively staggering in a row direction and a column direction in such a manner that a part of the adjacent image pickup area is overlapped while repeating many times to form a plurality of second patternsin the row direction and the column direction; and a third step of obtaining distortion according to the amount of deviation between the first and second marks transferred to the substrate and the amount of the deviation of the peripheral marks in a part of the area.