The invention discloses a solar cell cleaning method which comprises the following steps: pre-cleaning a silicon wafer by using an O3-containing solution, and washing the pre-cleaned silicon wafer with water; performing alkali polishing on the silicon wafer, and washing with water; cleaning the silicon wafer after alkali polishing by using a O3-containing solution, and cleaning the silicon wafer by using an HCL and HF-containing mixed solution; and washing the silicon wafer with water, and drying the silicon wafer. According to the technical scheme, before alkali polishing is carried out on the silicon wafer and after alkali polishing is carried out on the silicon wafer, the silicon wafer is cleaned by using the O3-containing solution, O3 is relatively easy to obtain, the cost is lower than that of a KOH+H2O2 mixed solution, therefore the cost of cleaning the silicon wafer can be reduced, and since O3 directly generates O2 after reaction, special pipelines, containers and the like do not need to be used for treating cleaned objects, so that the treatment process of the silicon wafer can be simplified, and the complexity of subsequent treatment is reduced.