The invention provides a flow-guiding mechanism, a crucible device, evaporation-plating equipment and an evaporation-plating method. The flow-guiding mechanism comprises a collecting pipe, a recyclingassembly and a flow-guiding assembly, wherein the collecting pipe is of a tubular structure with the two open ends and comprises a first end and a second end used for being arranged on an evaporationsource in a covering mode, the recycling assembly is arranged at the first end of the collecting pipe in a covering mode, the flow-guiding assembly is arranged in the collecting pipe, a gas inlet ofthe flow-guiding assembly faces the second end, a gas outlet of the flow-guiding assembly faces the first end, and the flow-guiding assembly is used for conducting flow guiding on gas particles released by the evaporation source into the recycling assembly. In this way, the flow-guiding mechanism is additionally arranged to absorb gas molecules released by the standby crucible device during the preset stage, and the situation that the film forming quality of an evaporation-plating technology is affected by the released gas particles is avoided.