The invention discloses a measuring method for simultaneously obtaining material temperature and emissivity in the spectral direction based on an infrared spectrometer. The measuring method comprisesthe step that step 1, the spectrometer is calibrated to obtain a coefficient in a characteristic function of the spectrometer; step 2, a sample to be measured is place in a sample slot, the sample isheated to T1, and radiation on the surface of the sample to be measured is measured by the spectrometer to obtain a curve 1; step 3, a heating piece is fine-tuned so that the thermal response change of the measured temperature of the sample to be measured can be less than 5K; the step 2 is carried out again, at the moment, the temperature of the sample to be measured is T2, and a spectral radiantenergy curve 2 on the surface of the measured sample is measured by the spectrometer; step 4, two specific wavelengths [lambda]1 and [lambda]2 are selected to obtain the following formula; and step 5,a global optimal algorithm is used for solving T1 and T2, and the true temperature of the sample to be measured at different times and the emissivity of the corresponding wavelength are obtained. Themeasuring method is a novel method for simultaneously obtaining the emissivity and temperature of a material in the spectral direction only based on directional spectral radiation measurement curvesat two groups of temperatures with a small difference.