The invention provides a device and a method for preparing or treating an auxiliary film aided by a pulse electric field. A thin film material is prepared below the pulse electric field. The preparation method is characterized in that a physical vapor deposition method is combined with the pulsed electric field, and the joule heat effect generated under the pulsed electric field is utilized to replace a traditional heating mode; the thin film material is oxidized in the pulsed electric field, the treatment mode is that oxidation treatment of the thin film material can be realized under the atmospheric condition, the treatment time is short, the temperature requirement is low, and a vacuum high-oxygen environment is not required to be realized; and the thin film material is subject to heattreatment by the pulse electric field, and the pulse electric field formed by the pulse current generator is used for carrying out heat treatment on the prepared electric thin film. When the pulsed electric field is used for preparing the thin film material, the pulse electric field can be instantly heated and cooled, so that the microstructure and the performance of the thin film are changed in the preparation process.