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发明公开
CN110554575A 基板保持装置、曝光装置以及物品的制造方法 有权

基板保持装置、曝光装置以及物品的制造方法
摘要：
提供一种基板保持装置、曝光装置以及物品的制造方法，能够减少曝光不均匀。基板保持装置包括：基座(521)，具有间隙；以及反射部件(523)，被设置于该间隙，将透射了基板(510)的光反射到基板侧，在该基板保持装置中，将反射部件(523)相对于基座(521)倾斜地配置。
摘要（英）：

The invention provides a substrate holding apparatus, an exposure apparatus, and a method of manufacturing an article, which can reduce exposure unevenness. This substrate holding device is provided with: a base (521) having a gap; and a reflection member (523) that is provided in the gap and reflects the light transmitted through the substrate (510) to the substrate side, the reflection member (523) being disposed so as to be inclined with respect to the base (521) in the substrate holding device.

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