Embodiments of the application relate to an integrated device and a method of forming the same. The method of forming an integrated device includes: pre-storing a plurality of via pillars in a storagetool; arranging a first via pillar selected from the plurality of via pillars to electrically connect to a circuit cell in a first circuit; analyzing an electromigration information of the first circuit to determine if the first via pillar induces EM phenomenon; arranging a second via pillar selected from the plurality of via pillars to replace the first via pillar of the circuit cell to generatea second circuit when the first via pillar induces EM phenomenon; and generating the integrated device according to the second circuit. The method can achieve a better power performance region resultwith reduced pin density.