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发明公开
CN110777362A 用于太阳能电池的化学气相沉积设备 审中-实审 转让

用于太阳能电池的化学气相沉积设备
摘要：
本发明提供用于太阳能电池的化学气相沉积设备。提供了一种化学气相沉积CVD设备，该CVD设备包括：室，该室具有内空间，多个硅晶圆以直立位置布置在室的内空间中；和多个喷头，所述多个喷头被构造为朝向多个晶圆的各侧边缘喷射由硅沉积气体和杂质气体组成的混合气体。所述多个喷头可以布置在所述多个硅晶圆的两侧处。
摘要（英）：

Provided is a chemical vapor deposition (CVD) equipment for a solar cell, including, a chamber having an inner space, a plurality of silicon wafers disposed in the inner space of the chamber in an upright position; and a plurality of shower nozzles configured to inject a mixed gas composed of a silicon deposition gas and an impurity gas toward each side edge of the plurality of wafers. The plurality of shower nozzles can be disposed at both sides of the plurality of the plurality of silicon wafers.

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