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Invention Publication
CN110832402A 清除方法、显露装置、光刻设备和器件制造方法 失效 - 放弃专利权

清除方法、显露装置、光刻设备和器件制造方法
Abstract:
本发明涉及一种用于显露由层覆盖的衬底上的传感器目标的方法，所述方法包括以下步骤：确定所述衬底上的具有良率目标部分的第一区域的部位和所述衬底上的具有非良率目标部分的第二区域的部位；至少部分去除覆盖所述第二区域中的特征的所述层的特征区以显露出所述第二区域中的特征；测量所述第二区域中的被显露出的传感器特征的部位；基于所述第二区域中的被显露出的传感器特征的被测量的部位确定所述第一区域中的传感器目标的部位；和使用所述第一区域中的传感器目标的被确定的部位至少部分去除覆盖所述第一区域中的所述传感器目标的所述层的传感器目标区。
Abstract(English):

The invention relates to a method for revealing sensor targets on a substrate covered with a layer, said method comprising the following steps: determining locations of first areas on the substrate with yielding target portions and of second areas on the substrate with non-yielding target portions; at least partially removing feature regions of the layer covering sensor targets in the second areasto reveal sensor targets in the second areas; measuring a location of the revealed sensor targets in the second areas; determining a location of sensor targets in the first areas based on the measured location of the revealed sensor targets in the second areas; and at least partially removing sensor target regions of the layer covering the sensor targets in the first areas using the determined location of the sensor targets in the first areas.

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