The utility model provides a sequential deposition device for a refractive index matching layer in shadow elimination glass. The sequential deposition device comprises a first sputtering unit for sputtering a target by use of a first working gas so that the atoms of the material of the target can be deposited on a substrate, and a second sputtering unit for sputtering the target by use of a second working gas so that the atoms of the material of the target can be deposited on the substrate. By use of a magnetron sputtering method, the sequential deposition device is capable of realizing the preparation of the refractive index matching layer only by changing the introduced gases without changing the target; the sequential deposition device is simple in structure, convenient to prepare, low in cost, capable of effectively eliminate etch shadow and advantageous for large-scale production of an enterprise.