发明公开
- 专利标题： Alignment apparatus
- 专利标题（中）： Ausrichtvorrichtung。
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申请号： EP81100559.4申请日： 1981-01-27
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公开(公告)号： EP0035113A1公开(公告)日： 1981-09-09
- 发明人: Johannsmeier, Karl-Heinz , Phillips, Edward H.
- 申请人： EATON-OPTIMETRIX INC.
- 申请人地址： 4001 North First Street San Jose California 95134 US
- 专利权人： EATON-OPTIMETRIX INC.
- 当前专利权人： EATON-OPTIMETRIX INC.
- 当前专利权人地址： 4001 North First Street San Jose California 95134 US
- 代理机构： Liesegang, Roland, Dr.-Ing.
- 优先权： US126007 19800229
- 主分类号： G03B41/00
- IPC分类号： G03B41/00 ; G05D3/10 ; H01L21/68
摘要：
A step-and-repeat alignment and exposure system (10) is provided with an adjustable holder (17) for holding a main reticle (12), a main optical unit (18, 21, 24) including a projection lens (18) for producing an image of the main reticle (12) at an image plane (77), a stage (20) movable along coordinate axes adjacent to the image plane (77), and a holder (131) rotatably mounted on the stage (20) for holding a semiconductive wafer (14) to be aligned with respect to the image of the main reticle (12). The system (10) is further provided with an adjustable holder (280) for holding an auxiliary reticle (23), a single channel auxiliary optical unit (31) including a main objective lens (33) for producing an image of the auxiliary reticle (23) at the image plane (77), and a reference mark (26) disposed on the stage (20) and aligned with respect to the coordinate axes. The stage (20) may be controlled for positioning the reference mark (26) directly beneath either the projection lens (18) or the main objective lens (33) of the single channel auxiliary optical unit (31) so that the images of both the main reticle (12) and the auxiliary reticle (23) may be aligned with respect to the reference mark (26).
公开/授权文献
- EP0035113B1 Alignment apparatus 公开/授权日：1985-12-11
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