发明公开
- 专利标题: Dot-enlargement process for photopolymer litho masks
- 专利标题(中): 光电子显微镜的扩散过程
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申请号: EP81109296申请日: 1981-10-29
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公开(公告)号: EP0052806A3公开(公告)日: 1983-03-16
- 发明人: Heiart, Robert Bernard , O'Neil, James William
- 申请人: E.I. DU PONT DE NEMOURS AND COMPANY
- 专利权人: E.I. DU PONT DE NEMOURS AND COMPANY
- 当前专利权人: E.I. DU PONT DE NEMOURS AND COMPANY
- 优先权: US209202 19801121
- 主分类号: G03F01/00
- IPC分类号: G03F01/00 ; G03F07/26 ; G03C05/00 ; G03F05/00
摘要:
An imaged element containing a polymeric relief or stencil image, in which the polymer contains crosslinkable moieties, is subjected to an image enlargement process by contacting the image with a solution containing a swelling agent for the image, and a crosslinking agent. The process is particularly useful in enlarging the half-tone image dot area of photopolymer litho masks wherein the half-tone image areas consist of hardened upper skins which rest on softer undervolumes having a lesser degree of polymerization or hardening.
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