发明公开
EP0052806A3 Dot-enlargement process for photopolymer litho masks 失效
光电子显微镜的扩散过程

Dot-enlargement process for photopolymer litho masks
摘要:
An imaged element containing a polymeric relief or stencil image, in which the polymer contains crosslinkable moieties, is subjected to an image enlargement process by contacting the image with a solution containing a swelling agent for the image, and a crosslinking agent. The process is particularly useful in enlarging the half-tone image dot area of photopolymer litho masks wherein the half-tone image areas consist of hardened upper skins which rest on softer undervolumes having a lesser degree of polymerization or hardening.
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