发明公开
EP0116116A2 Lift-off compensation of eddy current probes 失效
涡流样品中Abhebeeffekts的补偿。

  • 专利标题: Lift-off compensation of eddy current probes
  • 专利标题(中): 涡流样品中Abhebeeffekts的补偿。
  • 申请号: EP83109668.0
    申请日: 1983-09-28
  • 公开(公告)号: EP0116116A2
    公开(公告)日: 1984-08-22
  • 发明人: Bains, James A., Jr.
  • 申请人: AMF INCORPORATED
  • 申请人地址: World Headquarters 777 Westchester Avenue White Plains New York 10604 US
  • 专利权人: AMF INCORPORATED
  • 当前专利权人: AMF INCORPORATED
  • 当前专利权人地址: World Headquarters 777 Westchester Avenue White Plains New York 10604 US
  • 代理机构: Eisenführ, Speiser & Partner
  • 优先权: US457321 19830111
  • 主分类号: G01N27/90
  • IPC分类号: G01N27/90
Lift-off compensation of eddy current probes
摘要:
This invention relates to a method and apparatus for compensating the output signal of a reflection type eddy current probe so as to minimize the change in the phase shift of the probe output signal that otherwise would occur as a result of a change in the spacing of the probe from the surface of the metal sample being inspected or investigated.
公开/授权文献
信息查询
0/0