发明公开
- 专利标题: Apparatus and method for plasma treatment of resin material
- 专利标题(中): 用于等离子体处理树脂材料的装置和方法
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申请号: EP84101926.8申请日: 1984-02-23
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公开(公告)号: EP0120307A3公开(公告)日: 1989-05-03
- 发明人: Fukuta, Kenji , Kaneko, Takaoki , Takahashi, Yoshinobu
- 申请人: TOYOTA JIDOSHA KABUSHIKI KAISHA
- 申请人地址: 1, Toyota-cho Toyota-shi Aichi-ken 471 JP
- 专利权人: TOYOTA JIDOSHA KABUSHIKI KAISHA
- 当前专利权人: TOYOTA JIDOSHA KABUSHIKI KAISHA
- 当前专利权人地址: 1, Toyota-cho Toyota-shi Aichi-ken 471 JP
- 代理机构: Tiedtke, Harro, Dipl.-Ing.
- 优先权: JP29370/83 19830225; JP63733/83 19830413; JP63734/83 19830413; JP63735/83 19830413; JP115273/83 19830628; JP115274/83 19830628; JP134416/83 19830725
- 主分类号: H01J37/32
- IPC分类号: H01J37/32
摘要:
An apparatus for plasma treatment, capable of plasma-treating works of resin material by irradiating the surfaces of the works with a microwave discharge plasma within a vacuum reaction chamber, comprises a plurality of long plasma-irradiating tubular pipes, each of which is provided along the length thereof with numerous small holes for injecting plasma, and at least one plasma-irradiating straight pipe disposed with its free end opening toward a section to which the plasma is hard to flow. At least one second plasma-irradiating pipe is located movably to an optional position within the reaction chamber. A method for surface plasma-treatment comprises dividing a microwave generated in a magnetron in a plurality of microwaves by a distributor, introducing the divided microwaves into a plurality of plasma generating mechanisms, respectively, and introducing plasmas generated in the respective plasma generating mechanisms intothe reaction chamber through a plurality of plasma introducing ports, respectively, formed in the wall of the reaction chamber.
公开/授权文献
- EP0120307B1 Apparatus and method for plasma treatment of resin material 公开/授权日:1994-06-15
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