发明公开
- 专利标题: Method of purifying tantalum
- 专利标题(中): Verfahren zur Reinigung von Tantal。
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申请号: EP85309238.5申请日: 1985-12-18
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公开(公告)号: EP0185550A2公开(公告)日: 1986-06-25
- 发明人: Niwa, Kenji , Ichikawa, Ichiro
- 申请人: SUMITOMO CHEMICAL COMPANY, LIMITED
- 申请人地址: Kitahama 4-chome 5-33 Chuo-ku Osaka 541 JP
- 专利权人: SUMITOMO CHEMICAL COMPANY, LIMITED
- 当前专利权人: SUMITOMO CHEMICAL COMPANY, LIMITED
- 当前专利权人地址: Kitahama 4-chome 5-33 Chuo-ku Osaka 541 JP
- 代理机构: Moore, Anthony John (GB)
- 优先权: JP267029/84 19841218
- 主分类号: C22B34/24
- IPC分类号: C22B34/24 ; C22B34/00 ; C01G35/00
摘要:
Crude tantalum is dissolved in an aqueous hydrofluoric acid containing solution to forr tantalum-fluorine complex anions which are then extracted into an organic solvent solution of a water-insoluble quaternary ammonium compound having great affinity for the tantalum anions. The organic solution is next washed with an aqueous solution containing an inorganic acid and/or an ammonium salt to remove impurities extracted with the tantalum. Tantalum hydroxide precipitated by subsequent treatment with aqueous ammonia is recovered and calcined to yield tantalum pentoxide having a purity of five or six nines.
公开/授权文献
- EP0185550B1 Method of purifying tantalum 公开/授权日:1991-04-03
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