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1.发明公开Method of separating and purifying tantalum and niobium-containing compounds 失效一种用于钽和含铌化合物的分离和纯化过程。
公开(公告)号：EP0241278A2
公开(公告)日：1987-10-14
申请号：EP87303052.2
申请日：1987-04-08
发明人： Niwa, Kenji , Ichikawa, Ichiro , Motone, Masaharu
CPC分类号： C22B34/24 , C01G33/003 , C01G35/003 , C01G53/003 , C22B3/0016 , Y02P10/234
摘要： A method for obtaining a high-purity tantalum compound and a high-purity niobium compound comprises:
(a) dissolving a crude compound containing tantalum and niobium in hydrofluoric acid optionally with an inorganic acid, adjusting the resulting acidic aqueous solution to have a HF concentration not higher than 4 N, and contacting the acidic aqueous solution with a sparingly water-soluble organic solvent containing from 1.0 to 1.2 equivalents of a sparingly water-soluble quaternary ammonium compound per equivalent of the Ta in the aqueous solution, to selectively extract Ta in the aqueous solution in the organic solution;
(b) adjusting the HF concentration of the Ni-containing aqueous solution from step (a) to from 0.5 to 5 N and contacting the aqueous solution with a sparingly water-soluble organic solvent containing from 1.0 to 2.0 equivalents of a sparingly water-soluble quaternary ammonium compound per equivalent of the Ni contained in the aqueous solution, to extract the Ni into the organic solution;
(c) contacting the tantalum-containing organic solution obtained in (a) with an aqueous solution containing at least one inorganic acid and/or ammonium salt, and optionally HF, to remove impurities extracted concomitantly into the organic solution; and
(d) contacting the Ni-containing organic solution obtained in (b) with an aqueous solution containing HF and optionally an inorganic acid and/or ammonium salt, to remove impurities extracted concomitantly into the organic solution.
The method provides a Ta compound and Ni compound, particularly tantalum pentoxide and niobium pentoxide, having high purities (99.999% to 99.9999%) at high yields.摘要翻译： 一种用于获得高纯度的钽化合物和高纯度的铌化合物的方法包括：（a）将含有氢氟酸钽和铌任选地与无机酸的粗化合物，调节所得酸性wässrige溶液以具有HF浓度 不高于4个N，并且与接触从1.0至1.2当量每在Ta在wässrige溶液的当量的微溶于水的季铵化合物的含有一个微溶于水的有机溶剂中的酸性溶液wässrige，选择性地提取的Ta 在有机溶液中的溶液wässrige; （B）调节从步骤含Ni的wässrige溶液的HF浓度（a）至0.5〜5 N和接触，从1.0至2.0当量的包含一个微溶于水的有机溶剂中的水溶液水难溶性 内包含的wässrige溶液，与Ni提取到有机溶液中的Ni当量的季铵化合物; （C）接触得到的含钽的有机溶液（A）与至少一种wässrige溶液含有无机酸和/或铵盐，以及任选地HF，以除去伴随萃取到有机溶液中的杂质; 和（d）使含Ni的有机的（b）获得具有在稀水溶液溶液含有HF和任选无机酸和/或铵盐，以除去伴随萃取到有机溶液中的杂质。 该方法提供了以高收率Ta化合物和Ni化合物，特别是五氧化二钽和五氧化二铌，具有高纯度（99.999％〜99.9999％）。
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公开(公告)号：EP0124297A2
公开(公告)日：1984-11-07
申请号：EP84302254.2
申请日：1984-04-02
发明人： Niwa, Kenji , Ichikawa, Ichiro
IPC分类号： G03F7/26
CPC分类号： G03F7/322
摘要： A developer for positive photoresists comprises an aqueous solution of (a) a quaternary ammonium hydroxide of the formula:
wherein Ri, R 2 , R 3 and R 4 are each a C 1-4 alkyl, C1-5 or hydroxyalkyl group, and (b) at least one development modifier which is a water-soluble aliphatic ketone, cyclic ether or tertiary amine, and optionally, (c) at least one water-soluble primary or secondary amines as further development modifier.
Preferred modifiers (b) are C3-8 ketones, 3- to 6-membered alicyclic ethers and C3-6 aliphatic amines.
Hydroxide (a) can be tetramethyl ammonium or trimethyl ethanol ammonium hydroxide.
A quinonediazide positive photoresist material is imagewise exposed and treated in the developer, to give a resist of high sensitivity and resolution, suitable for use in an electronic component.-
公开(公告)号：EP0124297B2
公开(公告)日：1992-10-14
申请号：EP84302254.2
申请日：1984-04-02
发明人： Niwa, Kenji , Ichikawa, Ichiro
IPC分类号： G03F7/26
CPC分类号： G03F7/322
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公开(公告)号：EP0185550A3
公开(公告)日：1989-03-22
申请号：EP85309238.5
申请日：1985-12-18
发明人： Niwa, Kenji , Ichikawa, Ichiro
CPC分类号： C22B34/24 , C01G35/003 , C22B3/0016 , Y02P10/234
摘要： Crude tantalum is dissolved in an aqueous hydrofluoric acid containing solution to forr tantalum-fluorine complex anions which are then extracted into an organic solvent solution of a water-insoluble quaternary ammonium compound having great affinity for the tantalum anions. The organic solution is next washed with an aqueous solution containing an inorganic acid and/or an ammonium salt to remove impurities extracted with the tantalum. Tantalum hydroxide precipitated by subsequent treatment with aqueous ammonia is recovered and calcined to yield tantalum pentoxide having a purity of five or six nines.
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5.发明公开
公开(公告)号：EP0241278A3
公开(公告)日：1989-07-19
申请号：EP87303052.2
申请日：1987-04-08
发明人： Niwa, Kenji , Ichikawa, Ichiro , Motone, Masaharu
CPC分类号： C22B34/24 , C01G33/003 , C01G35/003 , C01G53/003 , C22B3/0016 , Y02P10/234
摘要： A method for obtaining a high-purity tantalum compound and a high-purity niobium compound comprises:
(a) dissolving a crude compound containing tantalum and niobium in hydrofluoric acid optionally with an inorganic acid, adjusting the resulting acidic aqueous solution to have a HF concentration not higher than 4 N, and contacting the acidic aqueous solution with a sparingly water-soluble organic solvent containing from 1.0 to 1.2 equivalents of a sparingly water-soluble quaternary ammonium compound per equivalent of the Ta in the aqueous solution, to selectively extract Ta in the aqueous solution in the organic solution; (b) adjusting the HF concentration of the Ni-containing aqueous solution from step (a) to from 0.5 to 5 N and contacting the aqueous solution with a sparingly water-soluble organic solvent containing from 1.0 to 2.0 equivalents of a sparingly water-soluble quaternary ammonium compound per equivalent of the Ni contained in the aqueous solution, to extract the Ni into the organic solution; (c) contacting the tantalum-containing organic solution obtained in (a) with an aqueous solution containing at least one inorganic acid and/or ammonium salt, and optionally HF, to remove impurities extracted concomitantly into the organic solution; and (d) contacting the Ni-containing organic solution obtained in (b) with an aqueous solution containing HF and optionally an inorganic acid and/or ammonium salt, to remove impurities extracted concomitantly into the organic solution. The method provides a Ta compound and Ni compound, particularly tantalum pentoxide and niobium pentoxide, having high purities (99.999% to 99.9999%) at high yields.-
公开(公告)号：EP0124297B1
公开(公告)日：1989-01-11
申请号：EP84302254.2
申请日：1984-04-02
发明人： Niwa, Kenji , Ichikawa, Ichiro
IPC分类号： G03F7/26
CPC分类号： G03F7/322
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7.发明授权
公开(公告)号：EP0241278B1
公开(公告)日：1991-11-21
申请号：EP87303052.2
申请日：1987-04-08
发明人： Niwa, Kenji , Ichikawa, Ichiro , Motone, Masaharu
CPC分类号： C22B34/24 , C01G33/003 , C01G35/003 , C01G53/003 , C22B3/0016 , Y02P10/234
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公开(公告)号：EP0185550B1
公开(公告)日：1991-04-03
申请号：EP85309238.5
申请日：1985-12-18
发明人： Niwa, Kenji , Ichikawa, Ichiro
CPC分类号： C22B34/24 , C01G35/003 , C22B3/0016 , Y02P10/234
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公开(公告)号：EP0124297A3
公开(公告)日：1986-07-09
申请号：EP84302254
申请日：1984-04-02
发明人： Niwa, Kenji , Ichikawa, Ichiro
IPC分类号： G03F07/26
CPC分类号： G03F7/322
摘要： A developer for positive photoresists comprises an aqueous solution of (a) a quaternary ammonium hydroxide of the formula:
wherein Ri, R 2 , R 3 and R 4 are each a C 1-4 alkyl, C1-5 or hydroxyalkyl group, and (b) at least one development modifier which is a water-soluble aliphatic ketone, cyclic ether or tertiary amine, and optionally, (c) at least one water-soluble primary or secondary amines as further development modifier. Preferred modifiers (b) are C3-8 ketones, 3- to 6-membered alicyclic ethers and C3-6 aliphatic amines. Hydroxide (a) can be tetramethyl ammonium or trimethyl ethanol ammonium hydroxide. A quinonediazide positive photoresist material is imagewise exposed and treated in the developer, to give a resist of high sensitivity and resolution, suitable for use in an electronic component.-
公开(公告)号：EP0185550A2
公开(公告)日：1986-06-25
申请号：EP85309238.5
申请日：1985-12-18
发明人： Niwa, Kenji , Ichikawa, Ichiro
CPC分类号： C22B34/24 , C01G35/003 , C22B3/0016 , Y02P10/234
摘要： Crude tantalum is dissolved in an aqueous hydrofluoric acid containing solution to forr tantalum-fluorine complex anions which are then extracted into an organic solvent solution of a water-insoluble quaternary ammonium compound having great affinity for the tantalum anions. The organic solution is next washed with an aqueous solution containing an inorganic acid and/or an ammonium salt to remove impurities extracted with the tantalum. Tantalum hydroxide precipitated by subsequent treatment with aqueous ammonia is recovered and calcined to yield tantalum pentoxide having a purity of five or six nines.
摘要翻译： 将粗钽溶解在含有氢氟酸的溶液中以形成钽 - 氟复合阴离子，然后将其提取到对钽阴离子具有很大亲和力的水不溶性季铵化合物的有机溶剂溶液中。 接着用含有无机酸和/或铵盐的水溶液洗涤有机溶液，以除去用钽提取的杂质。 回收用氨水处理沉淀的氢氧化钽，并煅烧得到纯度为五或六元的五氧化二钽。
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