发明公开
- 专利标题： Annealing method by irradiation of light beams
- 专利标题（中）： 通过Bestralung光热处理的方法。
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申请号： EP86104136.6申请日： 1986-03-25
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公开(公告)号： EP0196082A2公开(公告)日： 1986-10-01
- 发明人: Suzuki, Toshiharu , Kasahara, Jiro , Arai, Michio
- 申请人： SONY CORPORATION
- 申请人地址： 7-35 Kitashinagawa 6-chome Shinagawa-ku Tokyo 141 JP
- 专利权人： SONY CORPORATION
- 当前专利权人： SONY CORPORATION
- 当前专利权人地址： 7-35 Kitashinagawa 6-chome Shinagawa-ku Tokyo 141 JP
- 代理机构： TER MEER - MÜLLER - STEINMEISTER & PARTNER
- 优先权： JP60249/85 19850325
- 主分类号： H01L21/324
- IPC分类号： H01L21/324 ; H01L21/268 ; H01L21/66 ; G05D23/27
摘要：
An annealing method for heating a sample by applying radiation of light beams thereto, arranged so that the radiant power of the light beams is sampled or monitored by a light detector (a light detector 12, for example, formed of a phototransistor, photodiode, and the like) and the radiant power of the light beams is controlled through a feedback with the data derived from the monitoring used as the feedback control signal so that the heating temperature of the sample (5) is stablized. The annealing can be performed with excellent reproducibility from sample to sample.
公开/授权文献
- EP0196082B1 Annealing method by irradiation of light beams 公开/授权日：1991-01-02
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