发明公开
- 专利标题: Method of manufacturing a thin-film transistor
- 专利标题(中): 一种用于制造薄膜晶体管的方法。
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申请号: EP86310103.6申请日: 1986-12-23
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公开(公告)号: EP0232619A2公开(公告)日: 1987-08-19
- 发明人: Ishihara, Shunichi , Ootoshi, Hirokazu , Hirooka, Masaaki , Hanna,Junichi , Shimizu, Isamu
- 申请人: CANON KABUSHIKI KAISHA
- 申请人地址: 30-2, 3-chome, Shimomaruko, Ohta-ku Tokyo JP
- 专利权人: CANON KABUSHIKI KAISHA
- 当前专利权人: CANON KABUSHIKI KAISHA
- 当前专利权人地址: 30-2, 3-chome, Shimomaruko, Ohta-ku Tokyo JP
- 代理机构: Beresford, Keith Denis Lewis
- 优先权: JP292312/85 19851226
- 主分类号: H01L21/205
- IPC分类号: H01L21/205 ; H01L29/72 ; C23C16/24
摘要:
There is provided an improved thin-film transistor of which a principal semiconducting layer comprises a layer composed of an amorphous material prepared by (a) introducing (i) a gaseous substance containing atoms capable of becoming constituents for said layer into a film forming chamber having a substrate for thin-film transistor through a transporting conduit for the gaseous substance and (ii) a gaseous halogen series substance having a property to oxidize the gaseous substance into the film forming chamber through a transporting conduit for the gaseous halogen series oxidizing agent, (b) chemically reacting the gaseous substance and the gaseous halogen series agent in the film forming chamber in the absence of a plasma to generate plural kinds of precursors containing exited precursors and (c) forming said layer on the substrate with utilizing at least one kind of those precursors as a supplier.
公开/授权文献
- EP0232619B1 Method of manufacturing a thin-film transistor 公开/授权日:1992-03-25
信息查询
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