发明公开
- 专利标题: Filling of vias in a metallic plane
- 专利标题(中): 在金属平面填充VIAS
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申请号: EP89120835.7申请日: 1989-11-10
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公开(公告)号: EP0373363A3公开(公告)日: 1991-09-11
- 发明人: Lazzarini, Donald Joseph , Samuelson, Carl Edwin , Wiley, Robert Taylor
- 申请人: International Business Machines Corporation
- 申请人地址: Old Orchard Road Armonk, N.Y. 10504 US
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 当前专利权人地址: Old Orchard Road Armonk, N.Y. 10504 US
- 代理机构: Klocke, Peter, Dipl.-Ing.
- 优先权: US284532 19881215
- 主分类号: H05K3/00
- IPC分类号: H05K3/00 ; B29C67/18 ; B29C43/18 ; H05K3/44 ; H05K1/05 ; B32B15/08
摘要:
Vias in a metallic plane of a desired thickness with a dielectric by providing a layer of dielectric material (5) between two sheets (1, 2) containing clearance holes (3, 4) of the metal of the metallic plane wherein the total thickness of the two sheets corresponds to the desired thickness. Also provided on each sheet is a mask (6, 7) having clearance holes that correspond to the clearance holes in the sheets. On each mask is provided a layer of dielectric (8, 9) and on each layer of dielectric is provided a release layer (10, 11). The composite is laminated to thereby cause dielectric from the layer between the two sheets and the layers adjacent the mask to fill the clearance holes and to bond the metallic planes together. The mask, remaining dielectric adjacent the mask, and release layer are then removed.
公开/授权文献
- EP0373363A2 Filling of vias in a metallic plane 公开/授权日:1990-06-20
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