发明公开
EP0402556A1 A method for improving the flatness of etched mirror facets
失效
Methode zur Verbesserung der EbenheitgeätzterSpiegelfacetten。
- 专利标题: A method for improving the flatness of etched mirror facets
- 专利标题(中): Methode zur Verbesserung der EbenheitgeätzterSpiegelfacetten。
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申请号: EP89810463.3申请日: 1989-06-16
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公开(公告)号: EP0402556A1公开(公告)日: 1990-12-19
- 发明人: Buchmann, Peter Leo, Dr. , Vettiger, Peter , Voegeli, Otto, Dr. , Webb, David John, Dr.
- 申请人: International Business Machines Corporation
- 申请人地址: Old Orchard Road Armonk, N.Y. 10504 US
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 当前专利权人地址: Old Orchard Road Armonk, N.Y. 10504 US
- 代理机构: Barth, Carl Otto
- 主分类号: H01S3/025
- IPC分类号: H01S3/025 ; H01S3/085 ; H01S3/19 ; G02B6/12
摘要:
A method, and devices produced therewith, for improving the flatness of etched mirror facets (18) of integrated optic structures with non-planar stripe waveguides (17) such as ridge or groove diode lasers or passive devices like modulators and switches. The curvature in the mirror facet surface, occurring at the edges of the waveguide due to topographical, lithographical and etch process effects, that causes detrimental phase distortions, is avoided by widening the waveguide end (23) near the mirror surface (18) thereby shifting the curved facet regions away from the light mode region (24) to surface regions (29) where curvature is not critical.
公开/授权文献
- EP0402556B1 A method for improving the flatness of etched mirror facets 公开/授权日:1993-10-06
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