发明公开
EP0402867A2 Apparatus for microwave processing in a magnetic field
失效
Gerbe zur Bearbeitung mittels Mikrowellen in einem magnetischen Feld。
- 专利标题： Apparatus for microwave processing in a magnetic field
- 专利标题（中）： Gerbe zur Bearbeitung mittels Mikrowellen in einem magnetischen Feld。
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申请号： EP90111110.4申请日： 1990-06-12
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公开(公告)号： EP0402867A2公开(公告)日： 1990-12-19
- 发明人: Yamazaki, Shunpei , Hirose, Naoki , Kadono, Masaya , Ishida, Noriya , Ito, Kenji , Takayama, Toru , Arai, Yasuyuki
- 申请人： SEL SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
- 申请人地址： 398 Hase Atsugi-shi Kanagawa-ken 243 JP
- 专利权人： SEL SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
- 当前专利权人： SEL SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
- 当前专利权人地址： 398 Hase Atsugi-shi Kanagawa-ken 243 JP
- 代理机构： Grünecker, Kinkeldey, Stockmair & Schwanhäusser Anwaltssozietät
- 优先权： JP152909/89 19890615; JP152910/89 19890615
- 主分类号： H01J37/32
- IPC分类号： H01J37/32 ; H05H1/46
摘要：
A microwave-assisted plasma processing apparatus has a reaction chamber in which a substrate holder (13) is provided to support a substrate (1) to be treated. The holder is formed congruent with the inside of reaction chamber and located to substantially separate a reaction space (19) in the reaction chamber save for a narrow clearance therebetween through which exhausted gas passes from said reaction space into said auxiliary space. By this strucure, high density plasmas can be formed in the reaction chamber without substantial loss of input microwave energy.
公开/授权文献
- EP0402867B1 Apparatus for microwave processing in a magnetic field 公开/授权日：1995-03-01
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