发明公开
- 专利标题: Position detection method and apparatus
- 专利标题(中): 位置检测方法和装置
-
申请号: EP90308601.5申请日: 1990-08-03
-
公开(公告)号: EP0411966A3公开(公告)日: 1991-04-17
- 发明人: Matsugu, Masakazu , Saitoh, Kenji , Ohwada, Mitsutoshi
- 申请人: CANON KABUSHIKI KAISHA
- 申请人地址: 30-2, 3-chome, Shimomaruko, Ohta-ku Tokyo JP
- 专利权人: CANON KABUSHIKI KAISHA
- 当前专利权人: CANON KABUSHIKI KAISHA
- 当前专利权人地址: 30-2, 3-chome, Shimomaruko, Ohta-ku Tokyo JP
- 代理机构: Beresford, Keith Denis Lewis
- 优先权: JP203053/89 19890804; JP136827/90 19900525
- 主分类号: G01B11/14
- IPC分类号: G01B11/14 ; G01B11/26 ; G03F9/00 ; G03B41/00
摘要:
A position detecting method for detecting the position of a substrate by use of a grating pattern provided on the substrate includes irradiating the grating pattern with first and second radiation beams having different wavelengths to produce first and second diffraction beams of different wavelengths; and receiving the first and second diffraction beams by use of a sensor to determine the position of the substrate on the basis of the position of incidence of each of the first and second diffraction beams on the sensor.
公开/授权文献
- EP0411966B1 Position detection method and apparatus 公开/授权日:1994-11-02
信息查询