发明公开
EP0457076A2 Method for producing synthetic diamond thin film, the thin film and device using it
失效
一种用于生产薄的合成金刚石薄膜，薄膜和它的使用方法。
- 专利标题： Method for producing synthetic diamond thin film, the thin film and device using it
- 专利标题（中）： 一种用于生产薄的合成金刚石薄膜，薄膜和它的使用方法。
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申请号： EP91106700.7申请日： 1991-04-25
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公开(公告)号： EP0457076A2公开(公告)日： 1991-11-21
- 发明人: Muranaka, Yasushi , Yamashita, Hisao , Miyadera, Hiroshi
- 申请人： HITACHI, LTD.
- 申请人地址： 6, Kanda Surugadai 4-chome Chiyoda-ku, Tokyo 101 JP
- 专利权人： HITACHI, LTD.
- 当前专利权人： HITACHI, LTD.
- 当前专利权人地址： 6, Kanda Surugadai 4-chome Chiyoda-ku, Tokyo 101 JP
- 代理机构： Patentanwälte Beetz - Timpe - Siegfried Schmitt-Fumian - Mayr
- 优先权： JP108797/90 19900426; JP54775/91 19910319
- 主分类号： C23C16/26
- IPC分类号： C23C16/26
摘要：
The present invention provides a method for producing a synthetic diamond thin film (2) which comprises decomposing with microwave a raw material gas containing at least one compound selected from the group consisting of carbon monoxide, carbon dioxide and a hydrocarbon and hydrogen or hydrogen and oxygen to produce a plasma and contacting the plasma with the surface of a substrate (1) held outside the area irradiated with the microwave to form a diamond thin film (2) on the substrate (1).
The present invention further provides an apparatus for producing a synthetic diamond thin film and a synthetic diamond thin film and devices in which the synthetic diamond thin film is used.
The present invention further provides an apparatus for producing a synthetic diamond thin film and a synthetic diamond thin film and devices in which the synthetic diamond thin film is used.
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