发明公开
- 专利标题: PHOTOCURABLE RESIN COMPOSITION
- 专利标题(中): 光固化树脂组合物
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申请号: EP91902796申请日: 1991-01-29
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公开(公告)号: EP0465670A4公开(公告)日: 1992-06-03
- 发明人: NARAHARA, HISAO , INOUE, SATORU , KUROKI, TERUHISA , YAMAGUCHI, TATSUO , OOMIKA, HIROYOSHI
- 申请人: NIPPON PETROCHEMICALS CO., LTD.
- 申请人地址: 3-1, UCHISAIWAI-CHO 1-CHOME CHIYODA-KU; TOKYO 100
- 专利权人: NIPPON PETROCHEMICALS CO., LTD.
- 当前专利权人: NIPPON PETROCHEMICALS CO., LTD.
- 当前专利权人地址: 3-1, UCHISAIWAI-CHO 1-CHOME CHIYODA-KU; TOKYO 100
- 优先权: JP1796790 1990-01-30
- 主分类号: C08L91/06
- IPC分类号: C08L91/06 ; C08C19/28 ; C08F2/48 ; C08F2/50 ; C08F8/14 ; C08F8/46 ; C08F279/00 ; C08F279/02 ; C08F290/00 ; C08F290/12 ; C08F299/00 ; C08L13/00 ; C08L91/00 ; C09D5/00 ; C09D5/44 ; C09D109/00 ; G03F7/038 ; H05K3/28
摘要:
A photocurable resin composition comprising: (a) a modified resin prepared by the reaction of either a conjugate diene polymer having a number-average molecular weight of 500 to 5,000 and a vinyl content of at least 50 mole % or an adduct prepared from the diene polymer and an α,β-unsaturated dicarboxylic acid anhydride and having a softening of 70 to 200 °C as measured by the ring and ball softening point method of JIS K 2531-60 with an α,β-unsaturated monocarboxylic ester having an alcoholic hydroxyl group represented by general formula (I) to thereby effect the ring opening of at least 10 mole % of the acid anhydride groups of the adduct, wherein R1 and R2 each represents a hydrogen atom or a methyl group and R3 represents a residue of a C2 or higher hydrocarbon which may contain a heteroatom, (b) a wax having a melting point of 100 °C or below as determined by the dropping method of ASTM D 127, and (c) a photopolymerization initiator.
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