发明公开
- 专利标题： Positive type photoresist composition
- 专利标题（中）： 阳光照射光。
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申请号： EP91113522.6申请日： 1991-08-12
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公开(公告)号： EP0471326A1公开(公告)日： 1992-02-19
- 发明人: Yoda, Eiji , Sato, Haruyoshi, Nisseki Kagaku Shataku , Yamasita, Yukio , Yuasa, Hitoshi , Otsuki, Yutaka
- 申请人： NIPPON OIL COMPANY, LIMITED
- 申请人地址： 3-12, 1-chome, Nishi-Shimbashi Minato-ku Tokyo JP
- 专利权人： NIPPON OIL COMPANY, LIMITED
- 当前专利权人： NIPPON OIL COMPANY, LIMITED
- 当前专利权人地址： 3-12, 1-chome, Nishi-Shimbashi Minato-ku Tokyo JP
- 代理机构： Wehnert, Werner, Dipl.-Ing.
- 优先权： JP213731/90 19900814
- 主分类号： G03F7/039
- IPC分类号： G03F7/039 ; G03F7/023
摘要：
A positive type photoresist composition contains (a) 100 parts by weight of a resin which is a polymer compound (A) including carbon-carbon double bonds and having a molecular weight of 300 to 30,000 and an iodine value of 50 to 500. To at least a part of the double bonds of the polymer compound (A), a group represented by the formula (I) is introduced
wherein R¹ denotes a hydrogen atom, a halogen atom or an alkyl group having 1 to 3 carbon atoms and R² denotes an alkyl group having 1 to 10 carbon atoms, a cycloalkyl group or an aryl group. The composition further contains (b) 25 to 100 parts by weight of a compound containing a quinone diazide unit.
wherein R¹ denotes a hydrogen atom, a halogen atom or an alkyl group having 1 to 3 carbon atoms and R² denotes an alkyl group having 1 to 10 carbon atoms, a cycloalkyl group or an aryl group. The composition further contains (b) 25 to 100 parts by weight of a compound containing a quinone diazide unit.
公开/授权文献
- EP0471326B1 Positive type photoresist composition 公开/授权日：1995-11-02
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