发明公开
- 专利标题： PHOTOSENSITIVE POLYMER COMPOSITION AND PATTERN FORMATION
- 专利标题（中）： 镭射唱片专辑“MUSTERHERSTELLUNG”。
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申请号： EP92905096.1申请日： 1992-02-25
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公开(公告)号： EP0526650A1公开(公告)日： 1993-02-10
- 发明人: KATOU, Kouichi 10-3, Otsutomocho , MAEDA, Hirotoshi 10-2, Otsutomocho , KUNIMUNE, Kouichi 12-2, Ichihara
- 申请人： CHISSO CORPORATION
- 申请人地址： 6-32, Nakanoshima 3-chome, Kita-ku Osaka-shi, Osaka-fu 530 JP
- 专利权人： CHISSO CORPORATION
- 当前专利权人： CHISSO CORPORATION
- 当前专利权人地址： 6-32, Nakanoshima 3-chome, Kita-ku Osaka-shi, Osaka-fu 530 JP
- 代理机构： Hansen, Bernd, Dr.rer.nat.
- 优先权： JP53288/91 19910225
- 国际公布： WO9215045 19920903
- 主分类号： G03F7/023
- IPC分类号： G03F7/023 ; G03F7/038 ; G03F7/039 ; G03F7/075 ; H01L21/027
摘要：
A photosensitive polymer composition comprising mainly a poly(amide)imide precursor containing repeating units represented by general formula (I), at least one quinone diazide compound and an organic solvent; and a method of pattern formation by using the composition (I), wherein R 1 represents a tri- or tetravalent carbocyclic aromatic or heterocyclic group; R 2 represents a C 2 or higher aliphatic, alicyclic, araliphatic, carbocyclic aromatic or heterocyclic group, or a polysiloxane group; X represents -O- or -NR 5 -, wherein R 5 represents hydrogen or a C 10 or lower organic group; R 3 represents a divalent organic group; R 4 represents hydrogen or a monovalent C 20 or lower organic group; Ar represents the hexa- or decavalent organic group: a, β, ψ or δ; k is an integer of 1 to 5; the sum of j, k and I is equal to the number of free valencies of Ar; m is 1 or 2; n is 0 or 1; and 1 m + n
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