发明公开
- 专利标题: Photoelectrochemical imaging system
- 专利标题(中): Photoelektrochemisches Abbildungsystem。
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申请号: EP92118630.0申请日: 1992-10-30
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公开(公告)号: EP0542061A1公开(公告)日: 1993-05-19
- 发明人: Tench, Morgan D.
- 申请人: ROCKWELL INTERNATIONAL CORPORATION
- 申请人地址: 2201 Seal Beach Boulevard Seal Beach, California 90740-8250 US
- 专利权人: ROCKWELL INTERNATIONAL CORPORATION
- 当前专利权人: ROCKWELL INTERNATIONAL CORPORATION
- 当前专利权人地址: 2201 Seal Beach Boulevard Seal Beach, California 90740-8250 US
- 代理机构: Wächtershäuser, Günter, Prof. Dr.
- 优先权: US793040 19911115
- 主分类号: G03F7/004
- IPC分类号: G03F7/004 ; B41C1/10 ; G03C1/705 ; G03C5/58
摘要:
A method and apparatus are provided for photoelectrochemical reproduction of an image on a plate or roller. For a printing press, the apparatus includes a reusable image roller coated with a oxide semiconductor. A plating solution is applied to the image roller as a thin film. The desired image is written onto the oxide semiconductor by light illumination that generates a photoelectrochemical reaction between the semiconductor and the plating solution. In a preferred embodiment, the image roller is coated with hydrophilic p-type NiO. The image is written onto the roller as dots of oleophilic metallic copper, which are formed on the NiO coating by laser-generated cathodic photoelectrodeposition. Subsequent erasure of the metallic copper image can be accomplished by chemical or electrochemical dissolution of the deposited copper. The method functions to create, erase, and recreate high-resolution images directly on a printing press roller without the necessity of precise matrix registration.
公开/授权文献
- EP0542061B1 Photoelectrochemical imaging system 公开/授权日:1998-08-12
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