发明公开
- 专利标题: GaN single crystal
- 专利标题(中): GaN单晶。
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申请号: EP94115739.8申请日: 1994-10-06
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公开(公告)号: EP0647730A3公开(公告)日: 1998-01-28
- 发明人: Tadatomo, Kazuyuki, c/o Itami Works of , Watabe, Shinichi, c/o Itami Works of , Okagawa, Hiroaki, c/o Itami Works of , Hiramatsu, Kazumasa
- 申请人: Mitsubishi Cable Industries, Ltd.
- 申请人地址: 8, Nishino-cho Higashimukaijima Amagasaki-shi Hyogo-ken 660 JP
- 专利权人: Mitsubishi Cable Industries, Ltd.
- 当前专利权人: Mitsubishi Cable Industries, Ltd.
- 当前专利权人地址: 8, Nishino-cho Higashimukaijima Amagasaki-shi Hyogo-ken 660 JP
- 代理机构: von Kreisler, Alek, Dipl.-Chem.
- 优先权: JP253098/93 19931008; JP62813/94 19940331; JP62815/94 19940331
- 主分类号: C30B29/38
- IPC分类号: C30B29/38
摘要:
A GaN single crystal having a full width at half-maximum of the double-crystal X-ray rocking curve of 5-250 sec and a thickness of not less than 80 µm, a method for producing the GaN single crystal having superior quality and sufficient thickness permitting its use as a substrate and a semiconductor light emitting element having high luminance and high reliability, comprising, as a substrate, the GaN single crystal having superior quality and/or sufficient thickness permitting its use as a substrate.
公开/授权文献
- EP0647730B1 GaN single crystal 公开/授权日:2002-09-11
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