发明公开
- 专利标题： NITROGEN GAS SUPPLY SYSTEM
- 专利标题（中）： GASZUFUHRSYSTEMFÜRSTICKSTOFF
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申请号： EP96900183申请日： 1996-01-08
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公开(公告)号： EP0750340A4公开(公告)日： 2006-03-08
- 发明人: OHMI TADAHIRO , ISHIHARA YOSHIO
- 申请人： TAIYO NIPPON SANSO CORP , OHMI TADAHIRO
- 专利权人： TAIYO NIPPON SANSO CORP,OHMI TADAHIRO
- 当前专利权人： TAIYO NIPPON SANSO CORP,OHMI TADAHIRO
- 优先权： JP112595 1995-01-09
- 主分类号： C23C14/32
- IPC分类号： C23C14/32 ; H01L21/00 ; B01D53/04 ; B65G49/07 ; C23C14/34 ; C23C14/46 ; C23C16/44 ; C23C16/455 ; F24F7/06 ; F25J3/04 ; F25J3/08 ; H01L21/02 ; H01L21/20 ; H01L21/302 ; H01L21/3065 ; H01L21/677 ; H01L21/68
摘要：
A nitrogen gas supply system for efficiently supplying nitrogen gas in an amount and of purity sufficient and necessary to a wafer processing device (31) for subjecting a wafer to a predetermined processing and a nitrogen gas tunnel type wafer transfer device (32) for transferring wafers via a gate valve (37). This nitrogen gas supply system comprises a route (38) for supplying high-purity nitrogen gas obtained by a cryogenic separator (33) which is a nitrogen gas generating device to the wafer processing device, (31), a circulating route (40) in which an outlet portion (32a) and an inlet portion (32b) of the wafer transfer device (32) are caused to communicate with each other via refining equipment (39) and a replenishing route (44) for replenishing nitrogen gas from a liquefied nitrogen storage tank (36) to the circulating route (40).
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