发明公开
- 专利标题: RAPID THERMAL PROCESSING APPARATUS AND METHOD
- 专利标题(中): 方法和设备快速热处理
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申请号: EP95928925.0申请日: 1995-08-28
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公开(公告)号: EP0797753A1公开(公告)日: 1997-10-01
- 发明人: CAMM, David, Malcolm
- 申请人: VORTEK INDUSTRIES LTD.
- 申请人地址: 1820 Pandora Street Vancouver British Columbia, V5L 1M5 CA
- 专利权人: VORTEK INDUSTRIES LTD.
- 当前专利权人: VORTEK INDUSTRIES LTD.
- 当前专利权人地址: 1820 Pandora Street Vancouver British Columbia, V5L 1M5 CA
- 代理机构: Jones, Michael Raymond, et al
- 优先权: US19940298163 19940830
- 国际公布: WO1996007071 19960307
- 主分类号: H01L21
- IPC分类号: H01L21 ; C23C16 ; F27B17
摘要:
An apparatus and method for rapidly and uniformly heating a workpiece (12) includes a plurality of walls defining a first chamber (20), a first source of radiation (44) for producing incident radiation on a first energy transfer surface of the workpiece (19), a holder for holding the workpiece in a workpiece plane in the chamber and a radiation absorbing surface on at least one wall of the chamber (22, 24, 26). The holder has an energy transfer surface, the energy surfaces of the holder and of the workpiece reflecting and emitting radiation in the chamber and the radiation absorbing surface absorbing non-incident radiation reflected and emitted from the energy transfer surfaces.
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