发明公开
EP0831512A4 IMPREGNATED CATHODE STRUCTURE, CATHODE SUBSTRATE USED FOR THE STRUCTURE, ELECTRON GUN STRUCTURE USING THE CATHODE STRUCTURE, AND ELECTRON TUBE
失效
STOCK阴极结构，阴极底本Stuktur，电子CANON结构中使用此结构与电子管
- 专利标题： IMPREGNATED CATHODE STRUCTURE, CATHODE SUBSTRATE USED FOR THE STRUCTURE, ELECTRON GUN STRUCTURE USING THE CATHODE STRUCTURE, AND ELECTRON TUBE
- 专利标题（中）： STOCK阴极结构，阴极底本Stuktur，电子CANON结构中使用此结构与电子管
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申请号： EP96916320申请日： 1996-06-06
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公开(公告)号： EP0831512A4公开(公告)日： 1999-02-10
- 发明人: UDA EIICHIROU , HIGUCHI TOSHIHARU , NAKAMURA OSAMU , KOYAMA KIYOMI , MATSUMOTO SADAO , OUCHI YOSHIAKI , KOBAYASHI KAZUO , SUDO TAKASHI , HOMMA KATSUHISA
- 申请人： TOSHIBA KK
- 专利权人： TOSHIBA KK
- 当前专利权人： TOSHIBA KK
- 优先权： JP14312795 1995-06-09
- 主分类号： H01J1/28
- IPC分类号： H01J1/28 ; H01J9/04 ; H01J23/04 ; H01J23/087 ; H01J1/14 ; H01J29/04
摘要：
An impregnated cathode structure using an impregnated cathode substrate which includes a large grain size, low porosity region and a small grain size, high porosity region disposed on the side of an electron emission surface of the large grain size, low porosity region, having a mean grain size smaller than a mean grain size in the large grain size, low porosity region and having a porosity greater than the porosity in the large grain size, low porosity region, and which is impregnated with an electron emission material.
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