发明公开
- 专利标题： Residue removal by supercritical fluids
- 专利标题（中）： 通过超临界流体去除残余物
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申请号： EP97307272.1申请日： 1997-09-18
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公开(公告)号： EP0836895A3公开(公告)日： 1998-09-16
- 发明人: McCullough, Kenneth John , Purtell, Robert Joseph , Rothman, Laura Beth , Wu, Jin-Jwang
- 申请人： INTERNATIONAL BUSINESS MACHINES CORPORATION
- 申请人地址： Armonk, NY 10504 US
- 专利权人： INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人： INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人地址： Armonk, NY 10504 US
- 代理机构： Boyce, Conor
- 优先权： US731538 19961016
- 主分类号： B08B7/00
- IPC分类号： B08B7/00 ; H01L21/00
摘要：
A method for the removal of residue from an etched precision surface such as a semiconductor sample is provided which comprises exposing said precision surface to a supercritical fluid or liquid CO 2 under appropriate conditions that are sufficient to remove the residue from the precision surface. Cryogenic aerosol may be used in conjunction with either the supercritical fluid or liquid CO 2 .
公开/授权文献
- EP0836895A2 Residue removal by supercritical fluids 公开/授权日：1998-04-22
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