公开(公告)号：EP0836895A2

公开(公告)日：1998-04-22

申请号：EP97307272.1

申请日：1997-09-18

申请人： INTERNATIONAL BUSINESS MACHINES CORPORATION

发明人： McCullough, Kenneth John ,  Purtell, Robert Joseph ,  Rothman, Laura Beth ,  Wu, Jin-Jwang

IPC分类号： B08B7/00 ,  H01L21/00

CPC分类号： H01L21/02071 ,  B08B7/0021 ,  H01L21/31116 ,  H01L21/31138 ,  Y10S134/902

摘要： A method for the removal of residue from an etched precision surface such as a semiconductor sample is provided which comprises exposing said precision surface to a supercritical fluid or liquid CO 2 under appropriate conditions that are sufficient to remove the residue from the precision surface. Cryogenic aerosol may be used in conjunction with either the supercritical fluid or liquid CO 2 .

摘要翻译： 提供了用于从诸如半导体样品的蚀刻精密表面去除残余物的方法，其包括在足以从精密表面除去残余物的合适条件下将所述精密表面暴露于超临界流体或液体CO 2。 低温气溶胶可以与超临界流体或液体二氧化碳结合使用。

公开(公告)号：EP0836895A3

公开(公告)日：1998-09-16

申请号：EP97307272.1

申请日：1997-09-18

申请人： INTERNATIONAL BUSINESS MACHINES CORPORATION

发明人： McCullough, Kenneth John ,  Purtell, Robert Joseph ,  Rothman, Laura Beth ,  Wu, Jin-Jwang

IPC分类号： B08B7/00 ,  H01L21/00

CPC分类号： H01L21/02071 ,  B08B7/0021 ,  H01L21/31116 ,  H01L21/31138 ,  Y10S134/902

摘要： A method for the removal of residue from an etched precision surface such as a semiconductor sample is provided which comprises exposing said precision surface to a supercritical fluid or liquid CO 2 under appropriate conditions that are sufficient to remove the residue from the precision surface. Cryogenic aerosol may be used in conjunction with either the supercritical fluid or liquid CO 2 .