发明公开
- 专利标题： COMPOSITIONS FOR POLISHING SILICON WAFERS AND METHODS
- 专利标题（中）： 抛光剂组合物用于硅盘和方法
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申请号： EP96916757.0申请日： 1996-05-30
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公开(公告)号： EP0840664A1公开(公告)日： 1998-05-13
- 发明人: LONCKI, Scott, B. , COOK, Lee, Melbourne , SHEN, James , PIERCE, Keith, G.
- 申请人： Rodel, Inc.
- 申请人地址： 451 Bellevue Avenue Diamond State Industrial Park Newark Delaware 19713 US
- 专利权人： Rodel, Inc.
- 当前专利权人： Rodel, Inc.
- 当前专利权人地址： 451 Bellevue Avenue Diamond State Industrial Park Newark Delaware 19713 US
- 代理机构： Blumenröhr, Dietrich, et al
- 优先权： US19950458036 19950601; US19950458039 19950601
- 国际公布： WO1996038262 19961205
- 主分类号： B24B37
- IPC分类号： B24B37 ; C09G1
摘要：
An improved slurry composition and methods of using it are provided for final polishing of silicon wafers. The composition comprises water, submicron silica particles between 0.2 and 0.5 percent by weight of this composition, a salt at a concentration of about 100 to about 1000 ppm, an amine compound at a concentration sufficient to effect a composition pH of about 8 to about 11, and a polyelectrolyte dispersion agent at a concentration of about 20 to about 500 ppm, wherein the composition has a total sodium and potassium content below about 1 ppm, and an iron, nickel, and copper content each below about 0.1 ppm, all ppm being parts per million by weight of the composition.
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