发明公开
- 专利标题： Self-cleaning focus ring
- 专利标题（中）： Selbstreinigender Fokusring
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申请号： EP98303467.9申请日： 1998-05-01
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公开(公告)号： EP0875919A2公开(公告)日： 1998-11-04
- 发明人: Kholodenko, Arnold , Mak, Steven S.Y.
- 申请人： Applied Materials, Inc.
- 申请人地址： 3050 Bowers Avenue Santa Clara, California 95054 US
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： 3050 Bowers Avenue Santa Clara, California 95054 US
- 代理机构： Bayliss, Geoffrey Cyril
- 优先权： US847012 19970501
- 主分类号： H01J37/32
- IPC分类号： H01J37/32
摘要：
A self-cleaning focus ring ( 90 ) for processing a substrate ( 25 ) in a plasma in a plasma zone, comprises a dielectric barrier ( 92 ) with a focusing surface ( 95 ) for directing and focusing a plasma onto a substrate surface, and an electrical conductor element ( 100 ) abutting at least a portion of the dielectric barrier ( 92 ). The conductor element ( 100 ) is electrically charged to attract the plasma ions toward the focusing surface ( 92 ) of the dielectric barrier ( 92 ), whereby the energetic impingement of the plasma ions on the focusing surface ( 95 ) reduces the formation of deposits on the dielectric barrier ( 92 ).
公开/授权文献
- EP0875919A3 Self-cleaning focus ring 公开/授权日：2003-05-28
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