发明公开
EP0911887A2 Light-emitting diode device and method for fabricating the same
审中-公开
Leuchtdiodenanordnung und Verfahren zu deren Herstellung
- 专利标题: Light-emitting diode device and method for fabricating the same
- 专利标题(中): Leuchtdiodenanordnung und Verfahren zu deren Herstellung
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申请号: EP98120254.2申请日: 1998-10-26
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公开(公告)号: EP0911887A2公开(公告)日: 1999-04-28
- 发明人: Kamiyama, Satoshi , Yoshii, Shigeo , Miyanaga, Ryoko , Nishikawa, Takashi , Saitoh, Tohru , Sasai, Yoichi
- 申请人: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
- 申请人地址: 1006, Oaza Kadoma Kadoma-shi, Osaka-fu, 571 JP
- 专利权人: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
- 当前专利权人: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
- 当前专利权人地址: 1006, Oaza Kadoma Kadoma-shi, Osaka-fu, 571 JP
- 代理机构: Grünecker, Kinkeldey, Stockmair & Schwanhäusser Anwaltssozietät
- 优先权: JP294317/97 19971027
- 主分类号: H01L33/00
- IPC分类号: H01L33/00
摘要:
The light-emitting diode device of the present invention includes an active layer (17), a p-type contact layer (22), a Schottky electrode (23) and an ohmic electrode (24). The active layer is formed over an n-type semiconductor substrate (11). The contact layer (22) is formed over the active layer (17). The Schottky electrode (23) is selectively formed on a portion of the contact layer (22) and makes Schottky contact with said portion of the contact layer (22). The ohmic electrode (24) surrounds the Schottky electrode (23) on the contact layer (22), is electrically connected to the Schottky electrode (23), and transmits the light emitted from the active layer (17). Alternatively, the Schottky electrode may be replaced by a pad electrode (42A) in ohmic contact with the contact layer (22,41A), a high-resistance region (43) being formed as a current blocking layer under the pad electrode (42A).
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