发明公开
EP1109202A3 Wafer processing chamber having separable upper and lower halves
审中-公开
晶片处理室具有可分离上半部和下半部
- 专利标题: Wafer processing chamber having separable upper and lower halves
- 专利标题(中): 晶片处理室具有可分离上半部和下半部
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申请号: EP00310725.7申请日: 2000-12-04
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公开(公告)号: EP1109202A3公开(公告)日: 2004-02-11
- 发明人: Ryan, Kevin Thomas , Kellerman, Peter Lawrence , Sinclair, Frank , Allen, Jr., Ernest Everett , Fish, Roger Bradford
- 申请人: Axcelis Technologies, Inc.
- 申请人地址: 55 Cherry Hill Drive Beverly, MA 01915 US
- 专利权人: Axcelis Technologies, Inc.
- 当前专利权人: Axcelis Technologies, Inc.
- 当前专利权人地址: 55 Cherry Hill Drive Beverly, MA 01915 US
- 代理机构: Burke, Steven David
- 优先权: US466416 19991217
- 主分类号: H01L21/00
- IPC分类号: H01L21/00
摘要:
A wafer processing apparatus includes a processing chamber having a top chamber portion and a bottom chamber portion, respectively. The apparatus further includes an annular ring valve associated with one of the top chamber portion and the bottom chamber portion which is operable to close the processing chamber for processing in a first position and open the processing chamber for access thereto in a second position. The ring valve, in the first position, provides a substantially uniform surface about an inner periphery of the closed processing chamber, and thereby facilitates uniform processing conditions. A method of accessing a wafer processing apparatus is also disclosed and includes moving an annular ring valve within a processing chamber between two positions. In the first position the annular ring valve sealingly blocks an access port of the processing chamber and thereby prohibits access thereto, and in the second position the annular ring valve does not block the access port, and permits access to the processing chamber. The annular ring valve has a substantially uniform inner peripheral surface, and thereby facilitates uniform processing conditions within the processing chamber when in the first position.
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