发明公开
EP1142928A1 Polysiloxane, method of manufacturing same, silicon-containing alicyclic compound, and radiation-sensitive resin compounds
有权
聚硅氧烷,制造,含硅脂环族化合物,和对辐射敏感的树脂的化合物的方法
- 专利标题: Polysiloxane, method of manufacturing same, silicon-containing alicyclic compound, and radiation-sensitive resin compounds
- 专利标题(中): 聚硅氧烷,制造,含硅脂环族化合物,和对辐射敏感的树脂的化合物的方法
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申请号: EP01108625.3申请日: 2001-04-05
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公开(公告)号: EP1142928A1公开(公告)日: 2001-10-10
- 发明人: Iwasawa, Haruo , Shimokawa, Tsutomu , Akihiro, Hayashi , Nishiyama, Satoru
- 申请人: JSR Corporation
- 申请人地址: 11-24, Tsukiji 2-chome, Chuo-ku Tokyo JP
- 专利权人: JSR Corporation
- 当前专利权人: JSR Corporation
- 当前专利权人地址: 11-24, Tsukiji 2-chome, Chuo-ku Tokyo JP
- 代理机构: Leson, Thomas Johannes Alois, Dipl.-Ing.
- 优先权: JP2000107207 20000407; JP2000291089 20000925; JP2000318752 20001019
- 主分类号: C08G77/04
- IPC分类号: C08G77/04 ; C08G77/14 ; C08G77/24 ; C08L83/04 ; C08L83/06 ; C08L83/14 ; C07F7/04 ; C07F7/08 ; C07F7/21 ; G03F7/004 ; G03F7/039 ; G03F7/075 ; C07C13/39
摘要:
A novel polysiloxane having the following structural units (I) and/or (II) and the structural unit (III),
wherein A 1 and A 2 are an acid-dissociable monovalent organic group, R 1 is hydrogen, monovalent (halogenated) hydrocarbon, halogen, or amino, R 2 is monovalent (halogenated) hydrocarbon group, or halogen. A method of preparing such a polysiloxane, a silicon-containing alicyclic compound providing this polysiloxane, and a radiation-sensitive resin composition comprising this polysiloxane are also provided. The polysiloxane is useful as a resin component for a resist material, effectively senses radiation with a short wavelength, exhibits high transparency to radiation and superior dry etching properties, and excels in basic resist properties required for resist materials such as high sensitivity, resolution, developability, etc.
wherein A 1 and A 2 are an acid-dissociable monovalent organic group, R 1 is hydrogen, monovalent (halogenated) hydrocarbon, halogen, or amino, R 2 is monovalent (halogenated) hydrocarbon group, or halogen. A method of preparing such a polysiloxane, a silicon-containing alicyclic compound providing this polysiloxane, and a radiation-sensitive resin composition comprising this polysiloxane are also provided. The polysiloxane is useful as a resin component for a resist material, effectively senses radiation with a short wavelength, exhibits high transparency to radiation and superior dry etching properties, and excels in basic resist properties required for resist materials such as high sensitivity, resolution, developability, etc.
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