发明公开
- 专利标题: Ionization chamber
- 专利标题(中): 电离室
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申请号: EP01306551.1申请日: 2001-07-31
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公开(公告)号: EP1178513A3公开(公告)日: 2004-05-06
- 发明人: Perkins, Patrick D. , Kernan, Jeffrey T.
- 申请人: Agilent Technologies, Inc. (a Delaware corporation)
- 申请人地址: 395 Page Mill Road Palo Alto, CA 94303 US
- 专利权人: Agilent Technologies, Inc. (a Delaware corporation)
- 当前专利权人: Agilent Technologies, Inc. (a Delaware corporation)
- 当前专利权人地址: 395 Page Mill Road Palo Alto, CA 94303 US
- 代理机构: Powell, Stephen David
- 优先权: US629467 20000731
- 主分类号: H01J27/02
- IPC分类号: H01J27/02 ; H01J27/20
摘要:
An ionization source has a chamber for ionizing a fluid sample, the chamber having surfaces to reduce the overall interaction with reactive samples. The inner surface walls of the ionization chamber may be formed from an inorganic conductive nitride or disulfide material or may be applied to a substrate as a coating. A method for reducing the interaction of a reactive analyte with an ion source comprises coating the source with an inert conductive material.
公开/授权文献
- EP1178513A2 Ionization chamber 公开/授权日:2002-02-06
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