发明公开
EP1254917A1 Polymer comprising acetylene repeating units, process for the production, composition for film formation containing the same, method of film formation and insulating film
有权
含有重复单元乙炔基，用于制备用于膜形成，并且聚合物组合物的膜形成的方法和绝缘膜聚合物
- 专利标题： Polymer comprising acetylene repeating units, process for the production, composition for film formation containing the same, method of film formation and insulating film
- 专利标题（中）： 含有重复单元乙炔基，用于制备用于膜形成，并且聚合物组合物的膜形成的方法和绝缘膜聚合物
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申请号： EP02009442.1申请日： 2002-04-25
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公开(公告)号： EP1254917A1公开(公告)日： 2002-11-06
- 发明人: Okada, Takashi , Sinohara, Noriyasu , Shirato, Kaori , Ebisawa, Masahiko , Nishikawa, Michinori , Yamada, Kinji
- 申请人： JSR Corporation
- 申请人地址： 11-24, Tsukiji 2-chome, Chuo-ku Tokyo JP
- 专利权人： JSR Corporation
- 当前专利权人： JSR Corporation
- 当前专利权人地址： 11-24, Tsukiji 2-chome, Chuo-ku Tokyo JP
- 代理机构： Leson, Thomas Johannes Alois, Dipl.-Ing.
- 优先权： JP2001131385 20010427
- 主分类号： C08G61/00
- IPC分类号： C08G61/00 ; C08F38/00 ; C08F238/00
摘要：
a composition for film formation which can be cured in a short time period and give a film having a low dielectric constant and excellent in heat resistance, adhesion and cracking resistance, a polymer for use in the composition and a process for producing the polymer. The composition prepared by dissolving the polymer having specific repeating units in a solvent has excellent film-forming properties. The polymer has repeating units represented by the following general formula (1):
wherein Z and Y are as defined hereinabove.
wherein Z and Y are as defined hereinabove.
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