Photodefinable dielectric layers
    2.
    发明公开
    Photodefinable dielectric layers 失效
    可光致介电层

    公开(公告)号:EP0659782A1

    公开(公告)日:1995-06-28

    申请号:EP94309000.1

    申请日:1994-12-05

    申请人: AT&T Corp.

    摘要: Applicants have discovered an improved photodefined dielectric materials comprising poly(aromatic diacetylenes). The preferred poly(aromatic diacetylenes) are copolymers of aromatic diacetylenes. Specific examples are 1) a copolymer of 4,4'-diethynyldiphenyl ether and m -diethynyl benzene and 2) a copolymer of 4,4'-diethynyldiphenyl ether and 4,4'-bis(3-ethynylphenoxy)-2,2',3,3',5,5',6,6'-octafluorobiphenyl. These copolymers can be photochemically crosslinked in patterns with exposure of 30 mJ/cm²µm and 60 mJ/cm²µm, respectively, and patterns have been produced in 10 µm thick films with features as small as 12 µm.

    摘要翻译: 申请人已经发现包含聚(芳族二乙炔)的改进的光限定介电材料。 优选的聚(芳族二乙炔)是芳族二乙炔的共聚物。 具体实例为1)4,4'-二乙炔基二苯基醚和间二乙炔基苯的共聚物和2)4,4'-二乙炔基二苯基醚和4,4'-双(3-乙炔基苯氧基)-2,2' ,3,3' ,5,5' ,6,6'-八氟联苯。 这些共聚物可以在曝光量分别为30mJ /cm²μm和60mJ /cm²μm的条件下进行光化学交联,并且在具有小至12μm的特征的10μm厚的膜中已经产生了图案。