发明公开
EP1261016A4 ELECTRON BEAM DEVICE AND SEMICONDUCTOR DEVICE PRODUCTION METHOD USING THE DEVICE
审中-公开
ELECTRON DEVICE而那些使用的半导体模块的制造方法
- 专利标题： ELECTRON BEAM DEVICE AND SEMICONDUCTOR DEVICE PRODUCTION METHOD USING THE DEVICE
- 专利标题（中）： ELECTRON DEVICE而那些使用的半导体模块的制造方法
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申请号： EP01980965申请日： 2001-11-02
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公开(公告)号： EP1261016A4公开(公告)日： 2007-06-27
- 发明人: NAKASUJI MAMORU , NOJI NOBUHARU , SATAKE TOHRU , HAMASHIMA MUNEKI , HATAKEYAMA MASAHIRO , WATANABE KENJI , KATO TAKAO , SOBUKAWA HIROSI , KARIMATA TSUTOMU , YOSHIKAWA SHOJI , KIMBA TOSHIFUMI , OOWADA SHIN , SAITO MUTSUMI
- 申请人： EBARA CORP
- 专利权人： EBARA CORP
- 当前专利权人： EBARA CORP
- 优先权： JP2000378040 2000-12-12; JP2000388385 2000-12-21; JP2001003666 2001-01-11; JP2001005128 2001-01-12; JP2001017901 2001-01-26; JP2001021183 2001-01-30; JP2001023804 2001-01-31; JP2001026580 2001-02-02; JP2001031901 2001-02-08; JP2001031906 2001-02-08; JP2001033599 2001-02-09; JP2001044964 2001-02-21; JP2001052095 2001-02-27; JP2001073380 2001-03-15; JP2001131238 2001-04-27; JP2001158571 2001-05-28
- 主分类号： G01N23/225
- IPC分类号： G01N23/225 ; H01J37/06 ; H01J37/063 ; H01J37/073 ; H01J37/18 ; H01J37/20 ; H01J37/22 ; H01J37/244 ; H01J37/28 ; H01J37/29 ; H01L21/027 ; H01L21/66
摘要：
An electron beam device for applying a primary electron beam onto a sample, and detecting a secondary electron beam produced from a sample surface by the irradiation to evaluate the sample surface, characterized in that the cathode of an electron gun for emitting primary electron beam have a plurality of emitters disposed at intervals on one circle centered on the optical axis of a primary electron optical system and emitting a primary electron beam, and the plurality of emitters are disposed so that points projected on a line parallel to the scanning direction of the primary electron beam are arranged at equal intervals.
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