发明公开
EP1276010A3 Radiation-sensitive, positive working coating composition based on carboxylic copolymers
审中-公开
基于羧基官能化共聚物的放射线敏感性，正性工作组合物涂层
- 专利标题： Radiation-sensitive, positive working coating composition based on carboxylic copolymers
- 专利标题（中）： 基于羧基官能化共聚物的放射线敏感性，正性工作组合物涂层
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申请号： EP02015549.5申请日： 2002-07-11
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公开(公告)号： EP1276010A3公开(公告)日： 2003-03-26
- 发明人: Hauck, Gerhard , Jarek, Mathias
- 申请人： Kodak Polychrome Graphics GmbH
- 申请人地址： An der Bahn 80 37520 Osterode/Harz DE
- 专利权人： Kodak Polychrome Graphics GmbH
- 当前专利权人： Kodak Polychrome Graphics GmbH
- 当前专利权人地址： An der Bahn 80 37520 Osterode/Harz DE
- 代理机构： VOSSIUS & PARTNER
- 优先权： US903824 20010712
- 主分类号： G03F7/023
- IPC分类号： G03F7/023
摘要：
A radiation-sensitive composition, positive-working coating compositions useful for the preparation of lithographic printing plates and lithographic printing plate precursors comprising the composition are disclosed. The composition comprises at least one quinonediazide compound and at least one carboxylic copolymer. The compositions produce lithographic printing plates that show high print run stability.
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