发明公开
EP1369903A2 Liquid vaporizing and gas feeding apparatus 审中-公开
用于液体的蒸发和气体供给的装置

  • 专利标题: Liquid vaporizing and gas feeding apparatus
  • 专利标题(中): 用于液体的蒸发和气体供给的装置
  • 申请号: EP02025881.0
    申请日: 2002-11-19
  • 公开(公告)号: EP1369903A2
    公开(公告)日: 2003-12-10
  • 发明人: Toki, Ikuo
  • 申请人: AERA JAPAN LTD.
  • 申请人地址: 2971-8 Ishikawa-cho Hachioji-shi, Tokyo JP
  • 专利权人: AERA JAPAN LTD.
  • 当前专利权人: AERA JAPAN LTD.
  • 当前专利权人地址: 2971-8 Ishikawa-cho Hachioji-shi, Tokyo JP
  • 代理机构: Meddle, Alan Leonard
  • 优先权: JP2002161316 20020603
  • 主分类号: H01L21/00
  • IPC分类号: H01L21/00
Liquid vaporizing and gas feeding apparatus
摘要:
A liquid vaporizing and feeding apparatus, having high heat transfer efficiency and capable of producing a large flow of vaporized gas from a small amount of liquid, utilizes an inclined vaporization plate which is held at a set temperature by a heater. Liquid, discharged by a nozzle in the vicinity of the upper end of the vaporization plate, is vaporized as it flows down an inclined upper face of the vaporization plate. When the volume of the liquid collected on the vaporization plate 20 reaches a designated amount, a level sensor 40 stops the inflow of liquid through the nozzle. Then, as vaporization continues, and the liquid level falls, the sensor causes inflow of liquid to resume. The cycle of stopping and resuming flow of liquid is repeated to maintain a constant liquid level.
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